ITO film (180 nm) on Corning 7980, 6 "x 6"x 0.5mm R: 9-15 ohm/sq, - FmITOonCorning798015215205US

ITO Coated Glass Substrate 1" x 1" x 0.7 mm, R:12-15 ohm/sq, Nominal ITO film thickness: 150 nm

ITO Coated Glass Substrate 10mm x 10 mm x 0.7 mm, R:12-15 ohm/sq, Nominal ITO film thickness: 150 nm

ITO Coated Glass Substrate 10mm x 10 mm x 1.1 mm, R:7-10 ohm/sq,Nominal ITO film thickness: 180 nm

KMg3(AlSi3O10)F2 -Synthetized fluorphlogopite, 20x20 x0.3 thick (mm) ,as cleaved

UV Grade Fused Silica Glass, (Corning 0F 7980 HPFS) Substrate, 8 mm in dia x 0.5 mm, 2 sides polished (60/40)

KMg3(AlSi3O10)F2 -Synthetized fluorphlogopite, 100x20 x0.3 thick (mm) , as cleaved

ZnO Ceramic Substrate 10x10x2.0 mm ,Fine ground

TiO2 Ceramic Substrate 10x10x0.5 mm , one side polished ( There're small pits on the surface.)

Fused Silica Wafer, 4" x 0.5 mm, 2 side polished

8% YSZ Ceramic Substrate 2"x 2"x0.5 mm, one side polished

Phlogopite Mica sheets, 25mm x 25mm x0.15mm thick, 100 sheets/pkg

ZnO(100nm) on Fused Silca 10x10x0.5mm