Cu Single Crystal Substrate: (110), 10mmDia. x1.0 mm, 1 side polished,
- Single crystal copper metallic substrate
- Purity: > 99.99% (Oxygen < 80 ppm)
- Size: 10mm Dia x 1.0 mm thickness
- Ori.: <110> +/-2 o
-
Edge orientation available with high cost upon request !
- Surface finish (RMS or Ra) : One side polished < 30A
- Packing: in 1000 class cleanroom with vacuumed bag
-
Application: substrates for metal, alloy film and biological material
Related Metallic Single Crystal Substrates and Related ( click picture below to choose )Bi-crystal Cu Ag Au Al Ni Wafer Box Film Coater 
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Cu Single Crystal Substrate: (110), 10mmDia. x1.0 mm, 1 side polished,
Cu Single Crystal Substrate: (110), 10mmDia. x1.0 mm, 1 side polished,
- Single crystal copper metallic substrate
- Purity: > 99.99% (Oxygen < 80 ppm)
- Size: 10mm Dia x 1.0 mm thickness
- Ori.: <110> +/-2 o
-
Edge orientation available with high cost upon request !
- Surface finish (RMS or Ra) : One side polished < 30A
- Packing: in 1000 class cleanroom with vacuumed bag
-
Application: substrates for metal, alloy film and biological material
Related Metallic Single Crystal Substrates and Related ( click picture below to choose )Bi-crystal Cu Ag Au Al Ni Wafer Box Film Coater
$299.00
Cu Single Crystal Substrate: (110), 10mmDia. x1.0 mm, 1 side polished,—
$299.00
Product Information
Product Information
Shipping & Returns
Shipping & Returns
Description
- Single crystal copper metallic substrate
- Purity: > 99.99% (Oxygen < 80 ppm)
- Size: 10mm Dia x 1.0 mm thickness
- Ori.: <110> +/-2 o
-
Edge orientation available with high cost upon request !
- Surface finish (RMS or Ra) : One side polished < 30A
- Packing: in 1000 class cleanroom with vacuumed bag
-
Application: substrates for metal, alloy film and biological material
Related Metallic Single Crystal Substrates and Related ( click picture below to choose )Bi-crystal Cu Ag Au Al Ni Wafer Box Film Coater
